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Z-Flex System
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Z-Flex System
 
The Z-Flex system combines the best of Ion Beam Etching and Ion Beam Sputtering.
This high value combination allows the customer to create thin film structures in common vacuum –
A significant value proposition compared to the competition Patterned Etch
 

Markets Include:
 - Data Storage
 - Thin Film Magnetics
 - Semiconductor
 - Reactive Ion Assisted Etching
 - Etching and overcoat processing

Applications:
 
 - Disk Slider fabrication
 - TMR and GMR applications
 - Semiconductor Failure Analysis
 - FINFET and advanced memory development